EUV-induced hydrogen plasma and particle release

Diagnostics for laser plasma EUV sources

A high repetition-rate laser plasma source, possessing distinct radiation and particle emission characteristics, is now a principal candidate light source for the next generation of technology for the fabrication of computer chips. For these sources to satisfy this critical need they will need to meet unprecedented levels of performance, stability and lifetime. We review here some of the princi...

Nanoimaging using soft X-ray and EUV laser-plasma sources

In this work we present three experimental, compact desk-top imaging systems: SXR and EUV full field microscopes and the SXR contact microscope. The systems are based on laser-plasma EUV and SXR sources based on a double stream gas puff target. The EUV and SXR full field microscopes, operating at 13.8 nm and 2.88 nm wavelengths are capable of imaging nanostructures with a sub-50 nm spatial reso...

Hydrogen Balmer Series Measurements in Laser- Induced Air Plasma

Time-resolved spectroscopy is employed to analyze micro plasma generated in laboratory air. Stark-broadened emission profiles for hydrogen alpha and beta allow us to determine plasma characteristics for specific time delays after plasma generation. Stark shift, asymmetry, and full width half maximum measurements are used to infer electron density. The measurements of hydrogen alpha and beta Bal...

High Efficiency Collector for Laser Plasma EUV Source

Quadrupole-induced resonant-particle transport in a pure electron plasma.

Small transverse magnetic quadrupole fields sharply degrade the confinement of non-neutral plasmas held in Malmberg-Penning traps. For example, a quadrupole magnetic field of only 0.02 G/cm doubles the diffusion rate in a trap with a 100 G axial magnetic field. Larger quadrupole fields noticeably change the shape of the plasma. The transport is greatest at an orbital resonance. These results ca...